Report Overview:
The EUV lithography market (EUVL) is expected to increase from US$ 1.51 billion in 2020, and is expected to reach US$ 9.82 Bn by 2027, growing at a CAGR of 26.7% during the forecast period. Extreme UV lithography is a next-generation lithography technology, which uses the smallest wavelength to create circuits with small features and obtain an output with better resolution. Lithography is used to print complex patterns that define integrated circuits onto semiconductor wafers. EUV lithography (EUVL) is one of the leading next generation lithography (NGL) technologies. Discharge-produced plasma (DPP) and laser-produced plasma (LPP) are the prominent technologies used to produce high power EUV radiation.
By using EUVL, we can get compact electronic chips with less power requirements. The technology features enhanced resolving power, and it is also cost-effective. Therefore, the global extreme ultraviolet lithography (EUVL) systems market is expected to witness moderate growth in the near future. However, limited acceptance and the risk of unknown technical flaws are estimated to hamper market growth. Also, projection lithography is projected to remain the semiconductor industry’s pattern technology of choice for years to come, owing to the successful installation of EUVL.
EUV lithography is primarily implemented by Integrated Device Manufacturers (IDM), foundries, and in the manufacturing fabless and memory integrated circuits/memory chips, and foundries account for nearly half the revenue share of the global market. In 2019, more than 5 in 10 units of EUV lithography devices sold were employed in foundries, and stakeholders in the market are expected to further enhance the technology to suit end user requirements better.
According to SEMI, the worldwide semiconductor manufacturing and inspection equipment billings reached USD 16.7 billion in the second quarter of 2018 out of which USD 13.2 billion market share of semiconductor inspection and manufacturing equipment was occupied by the Asian countries like Korea, China, Taiwan, and Japan accounting for a whopping 80% global share. EUV refers to the process that is soon to enter mainstream adoption (once all developmental impediments are cleared) as the means whereby the next generation of semiconductor chips will be fabricated - at nodes lower than 7nm. EUV has been in the development pipeline for decades and recently Samsung announced it would use the technique to manufacture the SOC powering its latest and greatest Galaxy Note 10 - the Exynos 9825.
Therefore, growing consumer electronics and automotive industries coupled with availability of skilled labor at low cost will further fuel growth in the global EUV Lithography market during the forecast period.
The Global EUV Lithography Industry Segmentation:
By Equipment
By End-user
By Region
The IDM segment is the largest end-user in 2018
EUV lithography is primarily implemented by Integrated Device Manufacturers (IDM), foundries, and in the manufacturing fabless and memory integrated circuits/memory chips, and foundries account for nearly half the revenue share of the global market. In 2019, more than 5 in 10 units of EUV lithography devices sold were employed in foundries, and stakeholders in the market are expected to further enhance the technology to suit end user requirements better. Leading IDMs in the EUV lithography market are Samsung (South Korea) and Intel (US). These companies have invested in ASML’s (Netherlands) R&D for the development of EUVL and have been the key customers of EUVL.
Asia Pacific to Account for Significant Market Share in EUV Market
APAC is witnessing growth in the EUV Market owing to the growing demand from Fab-less players at leading foundries and the rising number of wafer processing capability in the region. Additionally, there is the presence of a large number of foundries and leading IDMs such as Samsung (South Korea), SK Hynix (South Korea), and Toshiba (Japan) in the region. TSMC (Taiwan), the world’s leading foundry, is investing in the expansion of its wafer-processing capability and is planning to invest in the EUV lithography technology as well. The emerging market for performance and storage memory in consumer applications will significantly boost the adoption of EUV lithography in APAC.
Company Profiles and Competitive Intelligence
Key players in the EUV lithography market include ASML Holding (Netherlands), Nikon (Japan), Canon (Japan), Carl Zeiss (Germany), Toppan Printing (Japan), NTT Advanced Technology (Japan), Intel (US), Samsung (South Korea), SK Hynix (South Korea), Toshiba (Japan), TSMC (Taiwan), and GLOBALFOUNDRIES (US).
The report also provides in-depth analysis of EUV Lithography market dynamics such as drivers, restraints opportunities and challenges
Drivers
Restraints
The report also provides in-depth analysis of key trends in EUV Lithography market forecast:
| Sr. No. | Trends | Impact |
| 1 | The ability of the EUV lithography to further allow the shrinkage at a relatively reduced cost has led to its gaining popularity. | Positive |
| 2 | An increase in the demand for advanced packaging for miniaturized devices and significant technological advancements are leading to increased application of EUV lithography in foundry, thereby significantly contributing to market growth. | Positive |
The report also provides in-depth analysis of recent news, developments and investments
Company Profiles and Competitive Intelligence
The key players operating in the market are:
The unique insights provided by this report also includes the following:
Ask for free product review call with the author
Share your specific research requirements for a customized report
Request for due diligence and consumer centric studies
Request for study updates, segment specific and country level reports
Log in / Register
